HelloID vs SiYuan
Side-by-side trajectory, velocity, and editorial themes.
HelloID's IGA build-out leans into rule mining, entitlements, and audit completeness
HelloID ships a genuine, categorized changelog for its identity governance and administration platform across Provisioning, Service Automation, and General. The 2026.07 window is mostly fixes, with the forward-looking signal in a changes preview and recent governance features. The arc centers on its Governance module: rule mining, entitlement visibility, and complete audit trails.
HelloID is investing in compliance-grade governance: rule mining (now with configurable exception thresholds and rule creation directly from reports), a cross-system entitlements overview, and gap-free audit logging including deleted product requests. Provisioning correctness work, around correlation, SMTP handling, and reconciliation, is the recurring fix theme keeping that foundation reliable.
Expect the beta rule-mining feature to mature toward GA and further entitlement/audit reporting, with continued provisioning-correctness fixes underpinning the governance push.
SiYuan rides its 3.7 overhaul with rapid alpha polish on mobile and cross-platform
SiYuan is an open-source, local-first knowledge base. Its 3.7 line was a throughout renewal — a redesigned UI, a kernel plugin system, and a CLI — and the feed since has been a fast cadence of alpha releases (3.7.1, 3.7.2) grinding on mobile editing and cross-platform quirks across Android, HarmonyOS, iOS, and the Microsoft Store build.
The work is consolidating the 3.7 overhaul along three lines: extensibility (kernel plugins), cross-platform parity (HarmonyOS now treated as a first-class target alongside Android and iOS), and mobile editing polish. The 'step toward intelligence' language hints at AI features, but the concrete shipping is platform breadth and extensibility.
Expect 3.7.2 to stabilize out of alpha with continued mobile and HarmonyOS fixes; the kernel plugin system points toward a growing third-party plugin ecosystem as the next surface.
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